Substrate processing apparatus, pipe with measuring device, and measuring method
AssigneeKioxia Corporation
InventorShota ISHIKAWA
Life of this patent
Estimating the term…
Abstract
According to one embodiment, a substrate processing apparatus includes a processing container that processes a substrate, a gas supply pipe that supplies a processing gas to the processing container, a pump that evacuates an atmosphere in the processing container, an evacuating pipe that connects the processing container and the pump, one or more pairs of conductive terminals, and a measuring device that is one of an electrostatic capacitance measuring device, a frequency counter, or a resistance value measuring device. A first end portion of each of the one or more pairs of conductive terminals is inserted into the evacuating pipe. The measuring device is connected to a second end portion of the conductive terminal outside the evacuating pipe.
Claims20
A substrate processing apparatus comprising:
- a processing container that processes a substrate;
- a gas supply pipe that supplies a processing gas to the processing container;
- a pump that evacuates an atmosphere in the processing container;
- an evacuating pipe that connects the processing container and the pump;
- one or more pairs of conductive terminals, a first end portion of each of which is inserted into the evacuating pipe;
- and
- a measuring device that is connected to a second end portion of a conductive terminal outside the evacuating pipe, wherein the measuring device is one of an electrostatic capacitance measuring device, a frequency counter, or a resistance value measuring device.
An apparatus used in a substrate processing apparatus including a processing container that processes a substrate, and a pump that evacuates an atmosphere in the processing container,
- the apparatus comprising:
- a pipe;
- a measuring device that is one of an electrostatic capacitance measuring device, a frequency counter, or a resistance value measuring device;
- and
- one or more pairs of conductive terminals, a first end portion of each of which is inserted into the pipe, wherein
- the pipe connects the processing container and the pump, and
- the measuring device is connected to a second end portion of a conductive terminal outside the pipe.
A measuring method of a deposition film formed on an inner wall of an evacuating pipe that connects a processing container that processes a substrate and a pump that evacuates an atmosphere in the processing container, the measuring method comprising:
- measuring a resistance value between one or more pairs of conductive terminals, a first end portion of each of which is inserted into the evacuating pipe;
- and
- determining a thickness of the deposition film based on the resistance value.
Dependencies are inferred from the claim text.