Method of cleaning, support, and cleaning apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYi Chen HO, Chih Ping LIAO, Chi-Hsun LIN, Ker-Hsun LIAO
Life of this patent
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Abstract
A method of cleaning includes placing a semiconductor device manufacturing tool component made of quartz on a support. A cleaning fluid inlet line is attached to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component. A cleaning fluid is applied to the semiconductor device manufacturing tool component by introducing the cleaning fluid through the cleaning fluid inlet line and the tubular quartz projection.
Claims20
A support, comprising:
- an annular base and three or more vertically extending members arranged around the annular base,
- wherein the three or more vertically extending members include a shelf extending in a radial direction away from a center of the annular base, and
- a ratio of a distance from a top surface of the shelf to an uppermost surface of the three or more vertically extending members to a distance from a top surface of the annular base to the uppermost surface of the three or more vertically extending members ranges from 0.05 to 0.5.
A cleaning apparatus, comprising:
- a support including:
- an annular base;
- and
- three or more vertically extending members arranged around the annular base,
- wherein the three or more vertically extending members include a shelf extending in a radial direction away from a center of the annular base,
- a ratio of a length of the shelf extending in the radial direction to a distance from a top surface of the annular base to an uppermost surface of the three or more vertically extending members ranges from 0.05 to 0.8;
- and
- a cleaning fluid inlet line configured provide cleaning fluid.
A cleaning apparatus, comprising:
- an enclosure;
- a support arranged in the enclosure, wherein the support comprises an annular base and three or more vertically extending members arranged around the annular base,
- wherein the three or more vertically extending members include a shelf extending in a radial direction away from a center of the annular base,
- a ratio of an outer diameter of the annular base to an inner diameter of the annular base ranges from 1.2 to 2.3, and
- a length of a top surface of the shelf extending from the three or more vertically extending members ranges from 3 cm to 12 cm;
- and
- an inlet line configured to supply cleaning fluid into the enclosure.
Dependencies are inferred from the claim text.