Trap device
AssigneeKioxia Corporation
InventorsShusaku MATSUMOTO, Hiroshi MATSUBA, Akihito NOGUCHI
Life of this patent
Estimating the term…
Abstract
According to one embodiment, a trap device includes a trap tank wall surrounding an interior space, a tank-internal pipe extending into the interior space from an inlet side and having a first opening into the interior space, and an inner vessel in the interior space. The inner vessel has a bottom surface between the first opening and an outlet side, and a side-wall that extends toward the inlet side from the bottom surface and forms a second opening at a position along the first direction that is the same or closer to the inlet side than is the first opening. A gas flow space is provided between trap tank wall and the inner vessel to permit indirect gas flow from the second opening portion to the outlet side.
Claims20
A trap device, comprising:
- a trap tank wall portion surrounding an interior space, the trap tank wall portion having an inlet side and an outlet side;
- a tank-internal pipe portion extending from the trap tank wall portion into the interior space from the inlet side, the tank-internal pipe portion having a first opening portion that opens into the interior space;
- and
- an inner vessel in the interior space, the inner vessel including:
- a bottom portion with a bottom surface that faces the first opening portion, the bottom surface being spaced from the first opening portion in a first direction and being between the first opening portion and the outlet side, and
- a side-wall portion that extends toward the inlet side from the bottom surface and forms a second opening portion at a position along the first direction that is the same or closer to the inlet side than the first opening portion, wherein
- a gas flow space is between the trap tank wall portion and the inner vessel to permit indirect gas flow from the second opening portion to the outlet side.
A substrate processing apparatus, comprising:
- a processing chamber into which gas flows;
- an outlet piping system connected to the processing chamber into which gas from the processing chamber flows;
- a trap device connected to an outlet of the outlet piping system, the trap device including:
- a trap tank wall portion surrounding an interior space, the trap tank wall portion having a trap inlet side connected to the outlet of the outlet piping system and a trap outlet side;
- a tank-internal pipe portion extending from the trap tank wall portion into the interior space from the tank inlet side, the tank-internal pipe portion having a first opening portion that opens into the interior space;
- and
- an inner vessel in the interior space, the inner vessel including:
- a bottom portion with a bottom surface that faces the first opening portion, the bottom surface being spaced from the first opening portion in a first direction and being between the first opening portion and the tank outlet side, and
- a side-wall portion that extends toward the tank inlet side from the bottom surface and forms a second opening portion at a position along the first direction that is the same or closer to the tank inlet side than the first opening portion, wherein
- a gas flow space is between trap tank wall portion and the inner vessel to permit indirect gas flow from the second opening portion to the tank outlet side.
Dependencies are inferred from the claim text.