Processing chamber and semiconductor processing equipment

Semiconductor processing equipment comprising:

• a processing chamber including:
• a chamber body including a base that ascends and descends, a plurality of lift pins, and a lift pin bracket;
• wherein:
• a plurality of lift pin holes are formed passing through the base in a vertical direction at the base, the plurality of lift pins are arranged at the lift pin bracket and inserted into the plurality of lift pin holes in a one-to-one correspondence, a guiding part extending in the vertical direction is arranged at the lower surface of the base, the guiding part is slidingly connected to the lift pin bracket, and the guiding part ascends with the base and limits position of and cooperates with the lift pin bracket when a lower end of the guiding part contacts the lift pin bracket to cause the lift pin bracket and the plurality of lift pins to ascend with the guiding part;
• and
• when the base is at a transmission position, the lift pin bracket contacts a bottom wall of the chamber body, and the plurality of lift pins extend out from the upper surface of the base and are configured to support the wafer, and when the base is at a processing position, the lower end of the guiding part limits the position of and cooperates with the lift pin bracket, and top ends of the plurality of lift pins are not higher than the upper surface of the base;
• a spray plate arranged at the top of the processing chamber and configured to spray a process gas in the processing chamber;
• and
• a base ascending and descending mechanism arranged below the base and configured to drive the base to ascend and descend between the transmission position and the processing position.