Analysis apparatus, analysis method, analysis program, and plasma processing method
AssigneeHORIBA STEC, Co., Ltd.
InventorsYoko SATO, Daisuke HAYASHI
Life of this patent
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Abstract
An analysis apparatus includes: an emission detection unit that detects, for each wavelength, emission intensities of the plasma at measurement positions different from each other in a plane of a substrate; a classification unit that classifies data sets formed with the emission intensities at the respective measurement positions at each wavelength into a plurality of data aggregates at a plurality of wavelengths; and a representative data output unit that outputs representative data indicating distribution of the chemical species in the plane of the substrate, on the basis of the plurality of data aggregates.
Claims14
An analysis apparatus that analyzes a chemical species generated by processing of a substrate with plasma in a processing chamber, the analysis apparatus comprising:
- an emission detection unit that detects, for each wavelength, emission intensities of the plasma at measurement positions at least partially different from each other above a surface of the substrate;
- a classification unit that classifies data set elements formed with the emission intensities of the plasma at the respective measurement positions at each wavelength into a plurality of data aggregates at a plurality of wavelengths;
- and
- a representative data output unit that outputs representative data indicating distribution of the chemical species above the surface of the substrate, on a basis of the plurality of data aggregates.
An analysis method for analyzing emission intensity of a chemical species generated by processing of a substrate with plasma in a processing chamber, the analysis method comprising:
- detecting, for each wavelength, emission intensities of the plasma at measurement positions different from each other above a surface of the substrate;
- classifying data set elements formed with the emission intensities of the plasma at the respective measurement positions at each wavelength into a plurality of data aggregates at a plurality of wavelengths;
- and
- outputting representative data indicating distribution of the chemical species above the surface of the substrate, on a basis of the plurality of data aggregates.
A computer-readable medium including an analysis program that is used in an analysis apparatus that analyzes a chemical species generated by processing of a substrate with plasma in a processing chamber,
- the analysis apparatus including an emission detection unit that detects, for each wavelength, emission intensities of the plasma at measurement positions different from each other above a surface of the substrate,
- the analysis program causing a computer to exhibit:
- a function as a classification unit that classifies data set elements formed with the emission intensities of the plasma at the respective measurement positions at each wavelength into a plurality of data aggregates at a plurality of wavelengths;
- and
- a function as a representative data output unit that outputs representative data indicating distribution of the chemical species above the surface of the substrate, on a basis of the plurality of data aggregates.
A plasma processing method for processing a substrate with plasma in a processing chamber, the plasma processing method comprising:
- detecting emission intensities of the plasma at measurement positions different from each other above a surface of the substrate for each wavelength under a predetermined plasma processing condition;
- classifying data set elements formed with the emission intensities of the plasma at the respective measurement positions at each wavelength into a plurality of data aggregates at a plurality of wavelengths;
- outputting representative data indicating distribution of a chemical species above the surface of the substrate, on a basis of the plurality of data aggregates;
- evaluating a correlation between the plasma processing condition at a time when the representative data is output and the representative data;
- and
- changing the plasma processing condition on a basis of the correlation, to make the processing in a plane of the substrate uniform.
An analysis apparatus that analyzes a chemical species generated by processing of a substrate with plasma in a processing chamber, the analysis apparatus comprising:
- an emission detection unit that detects emission of the plasma at measurement positions different from each other above a surface of the substrate;
- a spectral data generation unit that generates, for each of the measurement positions, spectral data indicating emission intensities of the plasma for each wavelength as detected by the emission detection unit;
- a principal component analysis unit that performs principal component analysis on the spectral data at each wavelength for each of the measurement positions, to calculate a principal component score of the spectral data at each of the measurement positions;
- and
- a temporal change output unit that outputs a temporal change in the principal component score obtained by the principal component analysis unit.
An analysis method for analyzing a chemical species generated by processing of a substrate with plasma in a processing chamber, the analysis method comprising:
- detecting emission of the plasma at measurement positions different from each other above a surface of the substrate;
- generating, for each of the measurement positions, spectral data indicating emission intensities of the plasma for each wavelength as detected;
- performing principal component analysis on the spectral data at each wavelength for each of the measurement positions, to calculate a principal component score of the spectral data at each of the measurement positions;
- and
- outputting a temporal change in the calculated principal component score.
A computer-readable medium including an analysis program that is used in an analysis apparatus that analyzes a chemical species generated by processing of a substrate with plasma in a processing chamber,
- the analysis apparatus including an emission detection unit that detects emission of the plasma at measurement positions different from each other above a surface of the substrate,
- the analysis program causing a computer to exhibit:
- a function as a spectral data generation unit that generates, for each of the measurement positions, spectral data indicating emission intensities of the plasma for each wavelength as detected by the emission detection unit;
- a function as a principal component analysis unit that performs principal component analysis on the spectral data at each wavelength for each of the measurement positions, to calculate a principal component score of the spectral data at each of the measurement positions;
- and
- a function as a temporal change output unit that outputs a temporal change in the principal component score obtained by the principal component analysis unit.
Dependencies are inferred from the claim text.