Estimation algorithm generation device, information processing apparatus, estimation algorithm generation method and processing condition determination method

An information processing apparatus managing a substrate processing apparatus,

• the substrate processing apparatus executing a film process by supplying a processing liquid to an upper surface of a substrate on which a film is formed, and comprising a hardware processor, wherein
• the hardware processor determines a first processing condition for execution of the film process by the substrate processing apparatus,
• the estimation algorithm is a first function that calculates, using a first parameter, based on the first processing condition, a difference between film thicknesses obtained before and after the film process at any position in a radial direction of the substrate on which the substrate processing apparatus executes the film process,
• the first parameter is obtained by providing a plurality of first datasets to the first function to perform a regression analysis,
• each of the plurality of first datasets includes a first processing result and the first processing condition, with the first processing result being obtained after the substrate processing apparatus is driven according to the first processing condition and executes the film process,
• the first processing result includes a difference between film thicknesses obtained before and after execution of the film process at each of a plurality of different positions in the radial direction of the substrate, and
• determination of the first processing condition includes, in a case in which the first processing result that is calculated based on a temporary processing condition using the estimation algorithm satisfies an allowable condition, determining a temporary first processing condition as the first processing condition for driving the substrate processing apparatus.

An estimation algorithm generation method including:

• acquiring a plurality of first datasets;
• and
• determining a first parameter by providing the plurality of first datasets to a first function to perform a regression analysis, wherein
• each of the plurality of first datasets includes a first processing result and a first processing condition, with the first processing result being obtained after a substrate processing apparatus executes a film process according to the first processing condition by supplying a processing liquid to an upper surface of a substrate on which a film is formed,
• the first processing result includes a difference between film thicknesses obtained before and after execution of the film process at each of a plurality of different positions in a radial direction of the substrate, and
• the first function that expresses, using the first processing condition and the first parameter, a difference between film thicknesses obtained before and after execution of the film process at any position in the radial direction of the substrate, is predetermined.

A processing condition determination method that is executed by an information processing apparatus managing a substrate processing apparatus,

• the substrate processing apparatus executing a film process by supplying a processing liquid to an upper surface of a substrate on which a film is formed, wherein
• the processing condition determination method includes determining a first processing condition for execution of the film process by the substrate processing apparatus,
• the estimation algorithm is a first function for calculating a first processing result based on the first processing condition using a first parameter,
• the first processing result includes a difference between film thicknesses obtained before and after execution of the film process at each of a plurality of different positions in a radial direction of the substrate,
• the first parameter is obtained when a plurality of first datasets is provided to the first function and a regression analysis is performed,
• each of the plurality of first datasets includes the first processing result and the first processing condition, with the first processing result being obtained after the substrate processing apparatus executes the film process according to the first processing condition, and
• the determination of the processing condition includes, in a case in which a first processing result that is calculated based on a temporary first processing condition using the estimation algorithm satisfies an allowable condition, determining the temporary first processing condition as the first processing condition for driving the substrate processing apparatus.