Semiconductor Manufacturing Process with Simulated Process Window Model

A method for determining a process window for an R2R controller for producing one or a plurality of components in a production process, comprising:

• detecting that a measured value after a production process has been carried out on the component, and which characterizes a property of the component, deviates from a specified reference value for this measured value;
• defining, in response to the detecting, first value ranges for production machine configurations of downstream production processes of the component;
• predicting an influence on a final measurement result of the component on the basis of the first value ranges using trained data-based regression models;
• selecting a downstream process step which, according to the prediction, has one of the greatest influences on the final measurement result;
• and
• selecting a second value range for the selected downstream process step such that, use of the selected second value range with the selected downstream production process results in the final measurement being in a specified interval.