Singulation of lithium-containing photonic devices
AssigneeHyperLight Corporation
InventorsKevin Luke, Mian Zhang, Fan Ye, Roy Meade, Christian Reimer, Prashanta Kharel
Life of this patent
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Abstract
An optical device includes a substrate, an oxide layer on the substrate and an electro-optic device on the oxide layer. The oxide layer is at least one micrometer thick. The electro-optic device includes an electro-optic material having a thickness of not more than one micrometer. The silicon substrate, oxide layer, and the electro-optic material terminate at an edge. At least one of the silicon substrate has a thickness of at least five hundred micrometers or the edge includes a recessed region corresponding to a portion of the oxide layer.
Claims20
A photonic device, comprising:
- a substrate;
- an oxide layer of at least one micrometer on the substrate;
- an electro-optic device residing on the oxide layer and including an electro-optic material having a thickness of not more than one micrometer, the substrate, oxide layer, and the electro-optic material terminating at an edge, wherein a thickness of the substrate is compared with a thickness threshold, and in the event that the thickness is greater than or equal to the thickness threshold, the substrate is thinned to less than the thickness threshold;
- wherein at least one of the substrate has a thickness of at least five hundred micrometers or the edge includes a recessed region corresponding to a portion of the oxide layer.
A photonic device, comprising:
- a substrate;
- an oxide layer on the substrate;
- an electro-optic device residing on the oxide layer and including an electro-optic material having a thickness of not more than one micrometer, wherein a thickness of the substrate is compared with a thickness threshold, and in the event that the thickness is greater than or equal to the thickness threshold, the substrate is thinned to less than the thickness threshold;
- and
- wherein the substrate, oxide layer, and electro-optic material terminate at an edge, the edge being at an angle of at least eighty degrees and not more than one hundred degrees from a top surface of the substrate.
A method, comprising:
- determining a thickness of a substrate of a photonic device including an electro-optic device on a substrate structure, the substrate structure including the substrate and an oxide layer on the substrate, the electro-optic device residing on the oxide layer and including an electro-optic material having a thickness of not more than one micrometer;
- comparing a thickness of the substrate with a thickness threshold;
- and
- in the event that the thickness is greater than or equal to the thickness threshold, thinning the substrate to less than the thickness threshold;
- and
- singulating the electro-optic device to provide an edge for the electro-optic device based on the thickness, the substrate, the oxide layer, and the electro-optic material terminating at the edge, the singulating further including stealth dicing the substrate structure;
- wherein at least one of the substrate has a thickness of at least five hundred micrometers or the edge includes a recessed region corresponding to a portion of the oxide layer.
Dependencies are inferred from the claim text.