Suction device and laser device

A suction device comprising:

• an air guiding device;
• a flow inlet for generating a suction flow through the air guiding device into the flow inlet;
• wherein the air guiding device is configured such that a projection of the air guiding device onto a surface of an imaginary sphere covers at least 60% of the surface;
• wherein the projection is in a radial direction from a center point of the imaginary sphere to the surface of the imaginary sphere;
• wherein the center point of the imaginary sphere is arranged in a center of the flow inlet;
• wherein a radius of the imaginary sphere is selected to be so large that the imaginary sphere completely encloses the air guiding device;
• wherein the air guiding device further comprises a first opening which, in operation, faces a processing location on a substrate;
• and
• wherein the air guiding device further comprises a second opening through which a laser radiation can be emitted through the air guiding device and through the first opening;
• and
• wherein the substrate is a vulcanized rubber material.

A laser device comprising:

• a laser emitting device for emitting laser radiation to a substrate surface of a substrate and thereby processing the substrate surface in an irradiation region, wherein the substrate is a vulcanized rubber material;
• a suction device for sucking off process residues arising in the processing of the substrate surface;
• the suction device comprising:
• an air guiding device;
• a flow inlet for generating a suction flow through the air guiding device into the flow inlet;
• wherein the air guiding device is configured such that a projection of the air guiding device onto a surface of an imaginary sphere covers at least 60% of the surface;
• wherein the projection is in a radial direction from a center point of the imaginary sphere to the surface of the imaginary sphere;
• wherein the center point of the imaginary sphere is arranged in a center of the flow inlet;
• wherein a radius of the imaginary sphere is selected to be so large that the imaginary sphere completely encloses the air guiding device;
• wherein the air guiding device further comprises a first opening which, in operation, faces a processing location on a substrate;
• and
• wherein the air guiding device further comprises a second opening through which a laser radiation can be emitted through the air guiding device and through the first opening.

A suction device for sucking off process residues arising in the processing of the substrate surface, the suction device comprising:

• an air guiding device;
• a flow inlet for generating a suction flow through the air guiding device into the flow inlet;
• wherein the air guiding device is configured such that a projection of the air guiding device onto a surface of an imaginary sphere covers at least 60% of the surface;
• wherein the projection is in a radial direction from a center point of the imaginary sphere to the surface of the imaginary sphere;
• wherein the center point of the imaginary sphere is arranged in a center of the flow inlet;
• wherein a radius of the imaginary sphere is selected to be so large that the imaginary sphere completely encloses the air guiding device;
• wherein the air guiding device further comprises a first opening which, in operation, faces a processing location on a substrate;
• and
• wherein the air guiding device further comprises a second opening through which a laser radiation can be emitted through the air guiding device and through the first opening.