Control parameter setting method, substrate processing apparatus, and storage medium

A substrate processing apparatus comprising:

• a controller configured to control a first film forming module and a second film forming module that perform a film forming process on a substrate,
• wherein the controller includes:
• a parameter acquisitor configured to acquire a first parameter group which is a control parameter group including control parameters for controlling a film forming process in the first film forming module, and a second parameter group which is a control parameter group including control parameters for controlling a film forming process in the second film forming module;
• a film thickness information acquisitor configured to acquire a film thickness value of a processed film on a substrate subjected to film formation by the first film forming module based on the first parameter group and acquire a film thickness value of a processed film on a substrate subjected to film formation by the second film forming module based on the second parameter group;
• and
• a parameter updater configured to update the first parameter group and the second parameter group so that a difference between the film thickness value on the substrate acquired in the first film forming module and the film thickness value on the substrate acquired in the second film forming module is reduced.