Gas treatment system, semiconductor process system including the same, and gas treatment method using the same

A gas treatment method, comprising:

• treating a first gas exhausted from a first process chamber with a first scrubber;
• treating the first gas passing through the first scrubber with a catalytic reactor;
• and
• treating the first gas passing through the catalytic reactor with a second scrubber,
• wherein the catalytic reactor comprises a fluidized catalytic bed reactor, a catalyst flow member configured to provide a catalytic flow space, a catalyst supply line configured to supply a first catalyst to the catalyst flow member, a catalyst exhaust line configured to exhaust the first catalyst from the catalytic flow space, a catalyst mixing apparatus configured to receive the exhausted first catalyst and mix the exhausted first catalyst with a second catalyst to generate a mixed catalyst, and a catalyst supply apparatus configured to receive the mixed catalyst and supply the mixed catalyst to the catalyst supply line, and
• wherein the treating the first gas passing through the first scrubber with the catalytic reactor comprises:
• eliminating a portion of the first catalyst from the catalytic reactor while the first gas passes through the catalytic reactor;
• and
• introducing the second catalyst into the catalytic reactor while the first gas passes through the catalytic reactor.

A gas treatment method, comprising:

• treating a first gas exhausted from a first process chamber with a catalytic reactor;
• burning a second gas exhausted from a second process chamber with a combustion apparatus;
• receiving and treating the first gas and the second gas passing through the combustion apparatus with the catalytic reactor;
• and
• treating the first gas and the second gas passing through the catalytic reactor with a second scrubber,
• wherein the catalytic reactor comprises a fluidizing catalytic bed reactor, a catalyst flow member configured to provide a catalytic flow space, a catalyst supply line configured to supply a first catalyst to the catalyst flow member, a catalyst exhaust line configured to exhaust the first catalyst from the catalytic flow space, a catalyst mixing apparatus configured to receive the exhausted first catalyst and mix the exhausted first catalyst with a second catalyst to generate a mixed catalyst, and a catalyst supply apparatus configured to receive the mixed catalyst and supply the mixed catalyst to the catalyst supply line.