Passivated contact structure, solar cell and preparation method therefor, and photovoltaic module

A passivated contact structure for a solar cell, comprising:

• a passivation oxide layer arranged proximate to a silicon wafer of the solar cell;
• and
• a doped crystalline silicon layer arranged away from the silicon wafer;
• wherein a thickness of the passivation oxide layer is 2 nm to 3.5 nm, and a plurality of nanoscale micropores are distributed in the passivation oxide layer;
• wherein the micropores extends through the passivation oxide layer, a diameter of the micropores is 50 nm to 500 nm, and a quantity of the micropores is 1×104 pores/cm2 to 1.6×108 pores/cm2;
• wherein the doped crystalline silicon layer is a fragmented crystalline silicon layer doped with a first element and a second element, the first element is phosphorus element or boron element, and the second element is at least one of nitrogen element, carbon element, or oxygen element;
• and
• wherein a thickness of the fragmented crystalline silicon layer is 40 nm to 200 nm, and a size of a crystalline grain of the fragmented crystalline silicon layer is 30 nm to 100 nm.