Resist composition, resist pattern formation method, compound, and polymer compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHiroki KATO, Ryota KOBAYASHI, Makoto SATO
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHiroki KATO, Ryota KOBAYASHI, Makoto SATO
Estimating the term…
A resist composition containing a resin component that has a constitutional unit represented by Formula (a0-1) and a constitutional unit represented by Formula (a10-1). In the formulas, R and Rx1 represent a hydrogen atom; Y01, L01, and Yax1 represent a single bond or a divalent linking group; Rx01 represents an acid-dissociable group represented by Formula (Rx0-1); m01 represents an integer of 0 to 2; n01 represents an integer of 0 to 4; C01 represents a carbon atom; X01 represents a group that forms an aliphatic monocyclic group together with C01; R01 represents a hydrogen atom; R01 represents a hydrogen atom when n01 in Formula (a0-1) is 0; Wax1 represents an aromatic hydrocarbon group which may have a substituent; and nax1 represents an integer of 1 or greater
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:
A compound represented by General Formula (A0-1),
A polymer compound which has a constitutional unit (a02) represented by General Formula (a0-2),
A polymer compound which has a constitutional unit (a01) represented by General Formula (a0-1) and a constitutional unit (a10) represented by General Formula (a10-1),
Dependencies are inferred from the claim text.