Gas analysis device and substrate processing system comprising same

Abstract

The present invention relates to a gas analysis device and a substrate processing system comprising the same, and, more specifically, to a gas analysis device and a substrate processing system comprising the same, which can monitor or diagnose a substrate processing process by analyzing an analyte gas introduced into a process chamber for substrate processing or discharged from an exhaust line of the process chamber. The present invention provides a gas analysis device installed in a substrate processing system, the gas analysis device includes an ionizing unit which ionizes an introduced analyte gas to produce ionized gas; a mass analysis unit for analyzing the mass of the ionized gas received from the ionizing unit; and a vacuum pump coupled to the mass analysis unit to adjust the internal pressure of the mass analysis unit.

Dependencies are inferred from the claim text.