Rinse composition and manufacturing method of device using the same
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsJi-Min CHUN, Yong-Hwan CHO, Ye-Rin RYU, Shi-Yong YI, Jong-Hwan KIM
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Abstract
The present disclosure relates to a rinse composition including: a primary alcohol having 2 to 6 carbon atoms, a glycerol ether compound, a diol compound, and water, wherein the glycerol ether compound includes a compound represented by Chemical Formula 1, and the diol compound includes a compound represented by Chemical Formula 2. The rinse composition according to the present disclosure can secure excellent cleaning performance for resist residues while preventing damage to a pattern, such as pattern collapse, when performing a rinsing process for a micropattern formed in a photoresist process.
Claims9
A rinse composition comprising:
- a primary alcohol having 2 to 6 carbon atoms, a glycerol ether compound, a diol compound, and water,
- wherein the glycerol ether compound includes a compound represented by Chemical Formula 1 below, and
- the diol compound includes a compound represented by Chemical Formula 2 below:
- wherein R1 is a linear or branched alkyl group having 2 to 6 carbon atoms, and
- wherein R2 is hydrogen, a halogen group, or a substituted or unsubstituted linear or branched alkyl group having 1 to 3 carbon atoms.
Dependencies are inferred from the claim text.