Substrate cleaning system

A substrate cleaning system comprising:

• a base;
• a plurality of support structures arranged in parallel with each other on the base;
• a plurality of support frames connected to each of the plurality of support structures to be rotatable about a first axis and comprising a frame body and a guide rail formed on the frame body in a height direction;
• a plurality of upper brackets connected to each of the plurality of support frames to be movable in the height direction along the guide rail;
• a plurality of lower brackets arranged in a lower portion of the plurality of upper brackets, and connected to each of the plurality of support frames to be movable in the height direction along the guide rail;
• an upper brush connected to the plurality of upper brackets to be rotatable about a first rotation axis parallel to the first axis, and configured to clean an upper surface of a substrate;
• a lower brush connected to the plurality of lower brackets to be rotatable about a second rotation axis parallel to the first axis, and configured to clean a lower surface of the substrate;
• a rotation actuator connected to the upper brush and the lower brush;
• an upper load cell connected to an upper bracket;
• an upper stopper connected to a frame body of a support frame to be positioned below the upper load cell;
• a lower load cell arranged on the base;
• and
• a hinge portion connected to the frame body of the support frame and configured to press the lower load cell when the support frame rotates in a first rotation direction.