Conductive film and display device

A conductive film comprising:

• a substrate;
• a resin layer provided on one or both of two main surfaces of the substrate;
• a groove pattern formed in at least the resin layer;
• and
• a conductive part with which the groove pattern is filled, wherein
• the resin layer is obtained using a resin composition containing a release agent containing silicon, and a resin,
• the resin layer includes a surface-segregated release agent layer in which the release agent segregates, and a main body portion provided on a substrate side of the surface-segregated release agent layer,
• the surface-segregated release agent layer has a first surface opposite to the main body portion,
• the main body portion has a second surface on the substrate side,
• a thickness of the resin layer is 5100 nm or less, and
• in a case where the resin layer is subjected to time-of-flight secondary ion mass spectrometry in a thickness direction of the resin layer, a ratio R defined by Formula (1) using an intensity A1 of silicon-containing secondary ions derived from the release agent in the first surface of the surface-segregated release agent layer and an intensity A2 of silicon-containing secondary ions derived from the release agent in the second surface of the main body portion is 25% or less,
• Ratio
• ⁢
• R
• =
• 1
• ⁢
• 0
• ⁢
• 0
• ×
• A
• ⁢
• 2
• /
• A
• ⁢
• 1
• (
• 1
• )