Liquid crystal display substrate and method of manufacturing the same, and display device

A method of manufacturing a liquid crystal display substrate, the liquid crystal display substrate comprising a plurality of pixel units provided in a display region, the pixel unit comprising a first thin film transistor, the method of manufacturing the liquid crystal display substrate comprising:

• providing a base substrate;
• forming a first semiconductor layer on a side of the base substrate, wherein an active layer of the first thin film transistor is located in the first semiconductor layer;
• forming a first gate layer on a side of the first semiconductor layer away from the base substrate, wherein a gate electrode of the first thin film transistor is located in the first gate layer;
• forming a first conductive layer on a side of the first gate layer away from the base substrate, wherein the first conductive layer is electrically connected to the active layer of the first thin film transistor through a first via hole so as to form a first electrode of the first thin film transistor;
• forming a second via hole to expose the active layer of the first thin film transistor;
• forming a second conductive layer on a side of the first conductive layer away from the base substrate, wherein the second conductive layer is electrically connected to the active layer of the first thin film transistor through a second via hole so as to form a second electrode of the first thin film transistor;
• forming a planarization layer on a side of the second conductive layer away from the base substrate, wherein a part of the planarization layer fills the second via hole;
• forming a third conductive layer on a side of the planarization layer away from the base substrate, wherein the third conductive layer is electrically connected to the second conductive layer through a third via hole, and a pixel electrode of the pixel unit is located in the third conductive layer;
• forming a passivation layer on a side of the third conductive layer away from the base substrate;
• forming a fourth conductive layer on a side of the passivation layer away from the base substrate, wherein a common electrode of the plurality of pixel units is located in the fourth conductive layer;
• forming a liquid crystal layer on a side of the fourth conductive layer away from the base substrate, wherein the liquid crystal layer is located in the display region;
• and
• forming a black matrix layer on a side of the liquid crystal layer away from the base substrate, wherein the black matrix layer is located in the display region, and the black matrix layer comprises a black matrix region and a black matrix opening region,
• wherein the second conductive layer, the third conductive layer and the fourth conductive layer comprise a transparent conductive material, and an orthographic projection of the second via hole on the base substrate falls within an orthographic projection of the black matrix opening region on the base substrate.