Fluorite-based material thin film and semiconductor device comprising the same
AssigneeSamsung Electronics Co., Ltd.
InventorsDukhyun CHOE, Jinseong HEO
Life of this patent
Estimating the term…
Abstract
Provided is a fluorite-based material thin film including an orthorhombic crystal structure having a symmetric segment and a non-symmetric segment; and at least two domains having different polarization directions. At least one of, the symmetric segment is not present at a wall between the domains, or at least two symmetric segments are consecutive. Also provided is a semiconductor device including the fluorite-based material thin film having an orthorhombic crystal structure. A polarization direction of the fluorite-based material thin film is configured to be changed by a structural transition between the symmetric segment and the non-symmetric segment.
Claims6
A semiconductor device comprising:
- a fluorite-based material thin film including an orthorhombic crystal structure having a symmetric segment and a non-symmetric segment,
- wherein a polarization direction of the fluorite-based material thin film is configured to be changed by a structural transition between the symmetric segment and the non-symmetric segment.
Dependencies are inferred from the claim text.