Methods, Kits, And Photothermal Compositions For Removing Nail Coatings

A method of removing a nail coating, comprising a thermally responsive material and a nail product, from a subject's nail, the method comprising the steps of:

• (i) applying a photothermal nail composition, comprising at least one photothermal additive, on top of the nail coating;
• wherein the photothermal nail composition is or forms a removal layer on top of the nail product;
• and
• (ii) applying a removal stimulus to the removal layer for a sufficient amount of time to induce heat generation by the at least one photothermal additive and cause at least partial debonding, delamination, or detachment of the nail coating from the subject's nail or from an interface with the thermally responsive material;
• or
• applying a removal stimulus to the removal layer for a sufficient amount of time to induce heat generation by the at least one photothermal additive and cause at least partial expansion, shape change, and/or phase change of the thermally responsive material:
• optionally wherein the nail product is a nail polish, a nail gel product, a nail dip powder product, an artificial nail product, nail art, or a combination thereof.

A photothermal nail composition comprising:

• at least one photothermal additive;
• and
• a cosmetically acceptable carrier and/or matrix;
• wherein the photothermal additive is selected from the group consisting of a carbon material, an organic dye, an inorganic compound, an inorganic element, an inorganic alloy, and combinations thereof;
• wherein the at least one photothermal additive is present at a concentration ranging from about 0.001 wt. % to 99 wt. % of the total weight of the photothermal nail composition;
• and
• wherein the at least one photothermal additive present generates heat upon exposure to a removal stimulus producing an increase in temperature in the composition of by at least about 5° C., 10° C., 15° C., 20° C., 25° C., 30° C., 35° C., 40° C., 45° C., 50° C., 60° C., 70° C., 80° C., 90° C., 100° C., 110° C., 120° C., 130° C., 140° C., 150° C., 160° C., 170° C., or 180° C. following at least about 30 seconds to about 5 minutes of exposure to the removal stimulus, as compared to the composition prior to exposure to the removal stimulus.