Display device and method of manufacturing the same

A method of manufacturing a display device, the method comprising:

• forming a thin-film transistor on a substrate;
• forming an interlayer insulating layer on the thin-film transistor;
• forming a source/drain electrode and an auxiliary electrode, each of the source/drain electrode and the auxiliary electrode comprising a first conductive layer and a second conductive layer disposed on an upper surface of the first conductive layer, on the interlayer insulating layer as a same layer;
• forming a via insulating layer comprising a first opening exposing the auxiliary electrode, on the interlayer insulating layer and the source/drain electrode;
• etching the first conductive layer of the auxiliary electrode to form an undercut structure in which side surfaces of the first conductive layer of the auxiliary electrode are disposed inside side surfaces of the second conductive layer of the auxiliary electrode;
• forming a capping layer comprising:
• a first capping layer covering the side surfaces of the first conductive layer of the auxiliary electrode, and
• a second capping layer separated from the first capping layer and disposed on an upper surface of the second conductive layer of the auxiliary electrode;
• and
• sequentially forming a pixel electrode layer, a light emitting material layer and a common electrode layer on the capping layer.