Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorRyuji YAMAMOTO
Life of this patent
Estimating the term…
Abstract
There is provided a technique that includes: (a) preparing a first process container in which a substance X-containing layer is formed; (b) loading a substrate into the first process container in which the substance X-containing layer is formed; and (c) supplying a first processing agent to the substrate in the first process container in which the substance X-containing layer is formed, such that the first processing agent reacts with a substance X derived from the substance X-containing layer, thereby etching a surface of the substrate.
Claims23
A processing method comprising:
- (a) preparing a first process container in which a substance X-containing layer is formed;
- (b) loading a substrate into the first process container in which the substance X-containing layer is formed;
- and
- (c) supplying a first processing agent to the substrate in the first process container in which the substance X-containing layer is formed, such that the first processing agent reacts with a substance X derived from the substance X-containing layer, thereby etching a surface of the substrate.
A processing apparatus comprising:
- a first process container into which a substrate is loaded;
- a first processing agent supply system configured to supply a first processing agent to the substrate;
- a transporter configured to load the substrate into the first process container;
- and
- a controller configured to be capable of controlling the processing apparatus so as to perform a process including:
- (a) preparing the first process container in which a substance X-containing layer is formed;
- (b) loading the substrate into the first process container in which the substance X-containing layer is formed;
- and
- (c) supplying the first processing agent to the substrate in the first process container in which the substance X-containing layer is formed, such that the first processing agent reacts with a substance X derived from the substance X-containing layer, thereby etching a surface of the substrate.
A non-transitory computer-readable recording medium storing a program that causes, by a computer, a processing apparatus to perform a process comprising:
- (a) preparing a first process container in which a substance X-containing layer is formed;
- (b) loading a substrate into the first process container in which the substance X-containing layer is formed;
- and
- (c) supplying a first processing agent to the substrate in the first process container in which the substance X-containing layer is formed, such that the first processing agent reacts with a substance X derived from the substance X-containing layer, thereby etching a surface of the substrate.
Dependencies are inferred from the claim text.