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US 2026/0247874 A1Published application
Protective sealant for chalcogenide material and methods for forming the same
AssigneeMicron Technology, Inc.
InventorsFarrell M. Good, Robert K. K, Gurpreet S. Lugani
Life of this patent
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Abstract
Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.
Claims20
A method, comprising:
- forming a stack of materials that comprises a chalcogenide material for storing information coupled with a first electrode, a second electrode coupled with the chalcogenide material, and a conductive material;
- etching the stack of materials to form a pillar, wherein the etching exposes a sidewall of the chalcogenide material;
- depositing a first sealant material to form a first liner coupled with the sidewall of the chalcogenide material and extending between the first electrode and the second electrode;
- and
- depositing a second sealant material over the pillar to form a second liner coupled with the first liner, the first electrode, and the second electrode of the pillar, the second sealant material being a different material than the first sealant material.
2 more elements
A method, comprising:
- forming a stack of materials that comprises a chalcogenide material for storing information coupled with a first electrode, a second electrode coupled with the chalcogenide material, and a conductive material;
- etching the stack of materials to form a first pillar, a second pillar, and a trench separating the first pillar and the second pillar, wherein the etching exposes a first sidewall and a second sidewall of the chalcogenide material;
- depositing a first sealant material over the first pillar and the second pillar to form a first liner coupled with the first sidewall of the chalcogenide material and a second liner coupled with the second sidewall of the chalcogenide material;
- and
- depositing a second sealant material to form a third liner coupled with the first liner, the second liner, the first electrode, and the second electrode, the second sealant material being a different material than the first sealant material.
2 more elements
Dependencies are inferred from the claim text.