Conditioning method and plasma processing system
AssigneeTokyo Electron Limited
InventorsToshikatsu TOBANA, Moe SUGAWARA, Atsushi UENO, Takanori BANSE
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Abstract
A method of conditioning a plasma processing chamber, which is configured such that a tungsten-containing gas is supplied into an inside of the plasma processing chamber and plasma processing is applied to a substrate housed in the inside of the plasma processing chamber, the method includes (A) removing moisture from an inside of the plasma processing chamber using a gas free of the tungsten-containing gas, and (B) adjusting an internal environment of the plasma processing chamber by generating plasma while supplying a gas containing the tungsten-containing gas after (A).
Claims10
A method of conditioning a plasma processing chamber, which is configured such that a tungsten-containing gas is supplied into an inside of the plasma processing chamber and plasma processing is applied to a substrate housed in the inside of the plasma processing chamber, the method comprising:
- (A) removing moisture from an inside of the plasma processing chamber using a gas free of the tungsten-containing gas;
- and
- (B) adjusting an internal environment of the plasma processing chamber by generating plasma while supplying a gas containing the tungsten-containing gas after (A).
A plasma processing system comprising:
- a plasma processing chamber;
- a gas supply configured to supply a tungsten-containing gas into an inside of the plasma processing chamber;
- a power source configured to generate plasma by supplying electric power to the plasma processing chamber;
- and
- a controller configured to control the gas supply and the power source,
- wherein the controller is configured to control:
- (A) removing moisture from the inside of the plasma processing chamber using a gas free of the tungsten-containing gas;
- and
- (B) adjusting an internal environment of the plasma processing chamber by generating plasma while supplying a gas containing the tungsten-containing gas after (A).
Dependencies are inferred from the claim text.