Polymerizable compounds, photoresist compositions, and pattern formation methods

Abstract

A polymerizable compound including an anion; a cation; and a polymerizable group bonded to the anion or the cation wherein the anion comprises: (i) a monocyclic or polycyclic C3-60 aromatic group that comprises a first substituent group, and (ii) an anion stabilizing group, wherein the first substituent group comprises an anion group, wherein the anion group is selected from a sulfonate anion group, a sulfinate anion group, a sulfonimide anion group, a sulfamate anion group, or a sulfonamide anion group, wherein the anion stabilizing group is configured to form an intramolecular non-covalent bond with the anion group, and wherein the first substituent group further comprises the anion stabilizing group, or the monocyclic or polycyclic C3-60 aromatic group further comprises a second substituent group, wherein the second substituent group comprises the anion stabilizing group.

Dependencies are inferred from the claim text.