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US 2026/0243932 A1Published application
Method of manufacturing relief-type diffraction grating
AssigneeMitsubishi Electric Corporation
InventorsYoshiaki HIRATA, Yoshitaka KAJIYAMA, Misaki HANAOKA
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Abstract
A method of manufacturing a relief-type diffraction grating includes forming a first silicon nitride film on a silicon member, oxidizing the silicon member using the first silicon nitride film as a mask to change a part of the silicon member into a first silicon oxide film, removing the first silicon nitride film, and selectively removing the first silicon oxide film to form a first step portion in the silicon member.
Claims9
A method of manufacturing a relief-type diffraction grating, the method comprising:
- forming a first silicon nitride film on a silicon member;
- oxidizing the silicon member using the first silicon nitride film as a mask to change a part of the silicon member into a first silicon oxide film;
- removing the first silicon nitride film;
- and
- selectively removing the first silicon oxide film to form a first step portion in the silicon member.
2 more elements
Dependencies are inferred from the claim text.