Single-chamber atomic layer deposition apparatus with dual-lid closure system

An atomic layer deposition system, or ALD system, wherein the system comprises

• an ALD apparatus, comprising:
• a monobloc base having a body with a flanged rim;
• a dual-lid system including a first lid and a second lid, the latter being at least partly recessed with respect to the former to define an intermediate space in-between;
• and
• the ALD apparatus further includes one or more heat exchangers in mechanical contact with said body,
• wherein
• an inner wall of the body delimits an ALD reaction chamber, an opening of which is defined by the flanged rim,
• the body includes at least one port for intake or exhaust of a fluid to or from the ALD reaction chamber,
• the flanged rim defines two annular seal surfaces, including a first seal surface nested in a second seal surface, and
• peripheral areas of the first lid and the second lid conform to the two annular seal surfaces, whereby the dual-lid system is adapted to close the opening upon pressing said peripheral areas against the two annular seal surfaces to seal the latter, for the dual-lid system to form a vacuum chamber capping the flanged rim.

The ALD system according to claim Error! Reference source not found., wherein

• said body further includes one or more temperature sensors, and
• the system further comprises
• one or more temperature-imparting circuits connected to the one or more heat exchangers, and
• a PID temperature controller connected to each of the temperature sensors and the one or more heat exchangers.