Emissivity adjustment method
AssigneeSCREEN Holdings Co., Ltd.
InventorsAkihiro KOSO, Takahiro KITAZAWA, Tomohiro UENO
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AssigneeSCREEN Holdings Co., Ltd.
InventorsAkihiro KOSO, Takahiro KITAZAWA, Tomohiro UENO
Estimating the term…
A TC wafer including a thermocouple is heated by irradiation with light from halogen lamps, and a temperature of the TC wafer is measured by the thermocouple. The true temperature of the TC wafer measured by the thermocouple is converted into a voltage value using a voltage conversion table. A voltage value output from a radiation thermometer when the TC wafer is measured by the radiation thermometer is acquired. Emissivity is calculated based on the voltage value obtained by conversion of the true temperature of the TC wafer and the voltage value output from the radiation thermometer, and the calculated emissivity is set for the radiation thermometer. The emissivity is calculated based on the voltage value obtained by direct conversion of the true temperature of the TC wafer measured by the thermocouple, so that accurate emissivity can rapidly be calculated.
An emissivity adjustment method of adjusting emissivity set for a radiation thermometer installed in a thermal processing apparatus, the emissivity adjustment method comprising:
Dependencies are inferred from the claim text.