Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
AssigneeKokusai Electric Corporation
InventorNoriaki MICHITA
Life of this patent
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Abstract
It is possible to perform a modification process while suppressing a heat diffusion. There is provided a technique that includes: preparing a substrate provided with at least a first film formed thereon; and modifying the substrate by supplying an electromagnetic wave to the substrate while maintaining a temperature of the substrate equal to or less than a predetermined temperature such that an absorption rate of the electromagnetic wave of the first film is higher than an absorption rate of the electromagnetic wave of the substrate.
Claims18
A substrate processing method comprising:
- preparing a substrate provided with at least a first film formed thereon;
- and
- modifying the substrate by supplying an electromagnetic wave to the substrate for a temperature of the substrate to be equal to or less than a predetermined temperature such that an absorption rate of the electromagnetic wave of the first film is higher than an absorption rate of the electromagnetic wave of the substrate.
A substrate processing apparatus comprising:
- a process chamber in which a substrate provided with at least a first film formed thereon is accommodated;
- an electromagnetic wave supplier configured to supply an electromagnetic wave to the substrate;
- and
- a controller configured to be capable of controlling the electromagnetic wave supplier to by supply the electromagnetic wave to the substrate for a temperature of the substrate to be equal to or less than a predetermined temperature such that an absorption rate of the electromagnetic wave of the first film is higher than an absorption rate of the electromagnetic wave of the substrate.
A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform:
- preparing a substrate provided with at least a first film formed thereon;
- and
- modifying the substrate by supplying an electromagnetic wave to the substrate for a temperature of the substrate to be equal to or less than a predetermined temperature such that an absorption rate of the electromagnetic wave of the first film is higher than an absorption rate of the electromagnetic wave of the substrate.
Dependencies are inferred from the claim text.