Semiconductor device
AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorToshifumi NISHIGUCHI
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AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorToshifumi NISHIGUCHI
Estimating the term…
A semiconductor device includes first and second electrodes, a semiconductor layer with a first and second semiconductor regions, a third semiconductor region of a first conductivity type, and third and fourth electrodes. The first semiconductor region is located on the first electrode. The second semiconductor region is located on the first semiconductor region. The third semiconductor region is located between the second semiconductor region and the second electrode. The third electrode faces the second semiconductor region via a first insulating region. The fourth electrode is in the first semiconductor region via a second insulating region and is electrically connected to the second electrode. The second insulating region includes a first and second portions located between the first semiconductor region and the fourth electrode in a first direction and a second direction, respectively. A dielectric constant of the second portion is lower than that of the first portion.
A field plate MOSFET semiconductor device comprising:
A field plate MOSFET semiconductor device comprising:
Dependencies are inferred from the claim text.