A vcsel with self-aligned microlens to improve beam divergence
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJhih-Bin Chen, Ming Chyi Liu
Life of this patent
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJhih-Bin Chen, Ming Chyi Liu
Estimating the term…
In some embodiments, the present disclosure relates to an integrated chip structure including a reflector stack having a plurality of first reflector layers vertically interleaved with a plurality of second reflector layers. A lens stack is over the reflector stack and includes lens layers vertically interleaved with additional reflector layers. Peripheral portions of the lens layers include oxide segments having widths that increase as a distance over the reflector stack increases. One or more lower sidewall spacers are along sidewalls of the reflector stack. One or more upper sidewall spacers are along sidewalls of the lens stack. A dielectric structure is arranged on sidewalls of the one or more lower sidewall spacers and is separated from outermost sidewalls of the one or more upper sidewall spacers. The dielectric structure vertically extends from over a topmost surface of the lens stack to below a bottommost surface of the reflector stack.
An integrated chip structure, comprising:
An integrated chip structure, comprising:
An integrated chip structure, comprising:
Dependencies are inferred from the claim text.