Mask shape calculation method, program, and storage medium
OwnerTaiki KIMURA, Masafumi SUZUKIinventors
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OwnerTaiki KIMURA, Masafumi SUZUKIinventors
Estimating the term…
A method includes sampling K points based on a lithography target; selecting a first kernel provided in a first function representing a projection optical system related to a mask shape corresponding to the lithography target; determining a first optical image intensity at each of the K points corresponding to a first convolution integral of the first kernel and a second function representing the mask shape; discretizing the first convolution integral into N dimensions to generate a first matrix of K rows and N columns related to the first kernel and a first vector of K rows related to the first optical image intensity; and solving a linear equation Am=b using a matrix A including the first matrix, a vector b including the first vector, and a vector m corresponding to the second function, and calculating the second function.
A mask shape calculation method comprising:
A program for causing a computer to execute:
A storage medium on which a program is stored, the program for causing a computer to execute:
Dependencies are inferred from the claim text.