US 2026/0235945 A1Published application

Pellicle film, pellicle, exposure original plate with pellicle, exposure method, semiconductor manufacturing method, and liquid crystal display panel manufacturing method

AssigneeShin-Etsu Chemical Co., Ltd.

InventorsAkinori NISHIMURA, Toru Shirasaki

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Abstract

The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame.

Claims13

Dependent claims

A pellicle membrane comprising a membrane (BNNT membrane) having boron nitride nanotubes.

Dependencies are inferred from the claim text.

Facts

Application: 18/292,751Filed 28 Jul 2022
Priority: JP 2021-12496730 Jul 2021
Published: 13 Aug 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

G03F 1/62
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
G03F 7/20
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
C01B 21/0648
With boron: after-treatment, e.g. grinding, purification
G03F 1/64
Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof: characterised by the frames, e.g. structure or…

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