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US 2026/0235898 A1Published application
Encapsulation of thin film lithium-containing films for 3 dimensional integration
OwnerFan Ye, Mian Zhanginventors
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Abstract
A photonics device is described. The photonics device includes a thin film lithium-containing (TFLC) electro-optic layer, a lithium barrier structure, and an insulating layer between the TFLC electro-optic layer and the lithium barrier structure. The photonics device may also include an additional lithium barrier structure and/or an additional insulating layer. The TFLC electro-optic layer is between the additional lithium barrier structure and the lithium barrier structure.
Claims20
A photonics device, comprising:
- a thin film lithium-containing (TFLC) electro-optic layer;
- a lithium barrier structure;
- and
- an insulating layer between the TFLC electro-optic layer and the lithium barrier structure.
1 more element
An integrated photonics device, comprising:
- a thin film lithium-containing (TFLC) photonics integrated circuit (TFLC PIC) including a waveguide, a first lithium barrier structure, a second lithium barrier structure, a first dielectric layer, a second dielectric layer, and a plurality of electrodes in proximity to a portion of the waveguide, the waveguide including a TFLC electro-optic material being between the first dielectric layer and the second dielectric layer, the first dielectric layer being between the first lithium barrier structure and the waveguide, the second dielectric layer being between the second lithium barrier structure and the waveguide, the first dielectric layer and the second dielectric layer encapsulating the waveguide, the first lithium barrier structure and the second lithium barrier structure each having a width of at least twenty-five multiplied by a waveguide width;
- and
- an additional integrated circuit including an additional waveguide, the second lithium barrier structure being between the additional waveguide and the waveguide.
A method, comprising:
- providing a first lithium barrier structure;
- providing a first insulating layer on the first barrier structure;
- providing a thin film lithium-containing (TFLC) electro-optic layer on the first insulating layer, the first insulating layer being between the TFLC electro-optic layer and the first lithium barrier structure;
- providing a second insulating layer on the TFLC electro-optic layer;
- and
- providing a second lithium barrier structure on the second insulating layer, the second insulating layer being between the TFLC electro-optic layer and the second insulating barrier structure.
3 more elements
Dependencies are inferred from the claim text.