Sequencer focus quality metrics and focus tracking for periodically patterned surfaces
AssigneeIllumina, Inc.
InventorsThomas Baker, Kevin Early, Siqi Zhang, Rachel Abaskharon, Anmiv Prabhu, Patrick Wen
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AssigneeIllumina, Inc.
InventorsThomas Baker, Kevin Early, Siqi Zhang, Rachel Abaskharon, Anmiv Prabhu, Patrick Wen
Estimating the term…
Generation and use of a focus quality metric that is intensity independent is described. In one example, the focus quality metric is generated by acquiring an image, such as an image of a patterned surface of a flow cell, and processing all or part (e.g., a sub-region or sub-image) to generate a Fourier transform of the respective image data. By way of example, in one embodiment a discrete Fourier transform may be applied to a sub-region of an image of a patterned flow cell surface. A focus quality metric that is intensity independent may be derived from the Fourier transform of the image data.
A method for determining a focus quality metric, comprising:
A sequencing instrument, comprising:
A method for determining a focus quality metric, comprising:
A sequencing instrument, comprising:
Dependencies are inferred from the claim text.