Process chamber gas flow improvement

A processing system comprising:

• a process chamber comprising:
• a chamber body disposed around an interior volume;
• a substrate support positioned in the interior volume;
• and
• a plurality of gas injectors configured to direct gas into the interior volume, each gas injector positioned at a different angular location relative to a central vertical axis extending through a center of the substrate support;
• a gas supply system comprising
• a main gas line coupled with a plurality of gas sources that include a first gas source and a second gas source;
• a plurality of gas lines, each gas line of the plurality of gas lines coupled between the main gas line and one of the gas injectors;
• and
• one or more auxiliary gas lines including a first auxiliary gas line coupled between the first gas source and a first gas line of the plurality of gas lines;
• and
• a controller configured to:
• provide a first gas from the first gas source and a second gas from the second gas source to the first gas line through the main gas line;
• and
• provide the first gas from the first gas source to the first gas line through the first auxiliary gas line without going through the main gas line.

A method of processing a substrate comprising:

• positioning a substrate on a substrate support in an interior volume of a process chamber, the process chamber comprising a plurality of gas injectors configured to direct gas into the interior volume, each gas injector positioned at a different angular location relative to a central vertical axis extending through a center of the substrate support;
• providing a mixture of a first gas from a first gas source and a second gas from a second gas source to a first gas line and a second gas line of a plurality of gas lines through a main gas line, wherein each gas line of the plurality of gas lines is coupled between the main gas line and one of the gas injectors;
• providing the first gas from the first gas source to the first gas line through a first auxiliary gas line without having the flow from first auxiliary gas line go through the main gas line;
• and
• directing a flow of the first gas and the second gas into the interior volume of the process chamber through the plurality of gas injectors.