Photobases
AssigneeTechnische UniversitäT Wien
InventorsKlaus ABLEIDINGER, Robert LISKA, Jurgen STAMPFL
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Abstract
A triphenylphosphonium carboxylate salt of the following Formula (I) may be used as a photobase generator in a photopolymerizable composition containing at least one type of monomer for preparing photopolymers via curing the composition by irradiating with light of a suitable wavelength: R1 and R2 are each independently selected from —H and —OCH3, on each of the three phenyl radicals at least one of R1 and R2 represents —OCH3, and R3 is selected from —H or —CH3 and X is either absent or selected from a chemical bond, —CH2—, —O—CH2—, —CH2—O—, —C(═O)—, —O— or —S—.
Claims15
A method for preparing photopolymers comprising:
- providing a photopolymerizable composition comprising at least one type of monomer and a triphenylphosphonium carboxylate salt having Formula (I) as a photobase generator;
- and curing the composition by irradiating with UV light:
- wherein R1 and R2 are each independently selected from —H and —OCH3, wherein on each of the three phenyl radicals at least one of R1 and R2 represents —OCH3, and wherein R3 is selected from —H and —CH3 and X is either absent or selected from a chemical bond, —CH2—, —O—CH2—, —CH2—O—, —C(═O)—, —O— or —S—.
A triphenylphosphonium carboxylate salt of the following Formula (I)
- wherein R1 and R2 are each independently selected from —H or —OCH3 and
- wherein R3 is selected from —H or —CH3 and X is either absent or selected from —O— or —S—, wherein the salt is selected from the group consisting of the following:
(canceled)
Dependencies are inferred from the claim text.