Substrate cleaning system

Abstract

The substrate cleaning system includes a support device and a cleaning device including a pair of brushes configured to clean a surface of the substrate supported by the support device, wherein the support device may include a first drive holder configured to support the edge of the substrate, rotate about a first central axis, and rotate the substrate, a second drive holder configured to support the edge of the substrate, rotate about a second central axis, and rotate the substrate, and a support module configured to support the edge of the substrate, freely rotate in conjunction with rotation of the substrate by the first drive holder and the second drive holder, and configured such that a height relative to the ground is adjustable, wherein the first drive holder, the second drive holder, and the support module may be configured to support different points on the edge of the substrate.

Dependencies are inferred from the claim text.