Cleaning tool for substrate support member, substrate processing apparatus and method for cleaning substrate support member

A substrate processing apparatus comprising:

• a cleaning tool having a disc shape;
• a support unit including a plurality of substrate supports configured to support lower surfaces of the substrate and the cleaning tool;
• a rotation unit including a driver configured to rotate the support;
• a supply configured to supply a cleaning liquid to the lower surfaces of the substrate and the cleaning tool supported by the support unit;
• and
• a controller,
• wherein the lower surface of the cleaning tool includes a central region including a center portion and an outer region extending outward from the central region,
• in a state where the lower surface of the cleaning tool is supported by the plurality of substrate supports, the outer region includes at least one protrusion at which at least one of the plurality of substrate supports are in contact with the lower surface of the cleaning tool, and at least one recess at which remaining ones of the plurality of substrate supports are spaced apart from the lower surface of the cleaning tool,
• the control unit is configured to perform
• a first process of controlling the rotation unit to rotate the support in a state where the lower surface of the cleaning tool is supported by the plurality of substrate supports such that the at least one of the plurality of substrate supports is in contact with the at least one protrusion and the remaining ones of the plurality of substrate supports are spaced apart from the at least one recess, thereby rotating the cleaning tool, and
• a second process of controlling the supply to supply the cleaning liquid to the lower surface of the cleaning tool while rotating the cleaning tool in the first process.

A method for cleaning a plurality of substrate supports by a cleaning tool, the method comprising:

• supporting a lower surface of the cleaning tool on a plurality of substrate supports, wherein the lower surface of the cleaning tool includes a central region including a center portion and an outer region extending outward from the central region, the outer region includes at least one protrusion and at least one recess formed therein, and in a state where the lower surface of the cleaning tool is supported by the plurality of substrate supports, at least one of the plurality of substrate supports is in contact with the at least one protrusion, and remaining ones of the plurality of substrate supports are spaced apart from the at least one recess;
• after the supporting, first rotating the cleaning tool;
• and
• supplying the cleaning liquid to the lower surface of the cleaning tool while rotating the cleaning tool in the first rotating.