Concentrator for high flow rate gaseous substances and gaseous substance treatment system including same
AssigneeEnbion Inc.
InventorsHyun Jae LEE, Seung Kil LEE, Min Soo PARK, Sanggi LEE, Min Whee CHO
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Abstract
The present invention relates to a device for highly concentrating gaseous substances and an exhaust gas treatment device for treating the same. The present invention relates to a concentrator for concentrating gaseous substances in exhaust gas, the concentrator comprising: an adsorption member that forms a plurality of functional regions for adsorbing, concentrating, and desorbing the gaseous substances in the exhaust gas; and a driving unit for rotating the adsorption member relative to the exhaust gas.
Claims11
A concentration apparatus for concentrating gaseous substances, the concentration apparatus comprising:
- an adsorption member configured to form a plurality of functional regions for adsorbing, concentrating, and desorbing gaseous substances in exhaust gas discharged from an emission source;
- and
- a driving unit configured to relatively rotate the adsorption member with respect to the gaseous substances,
- wherein the plurality of functional regions of the adsorption member include an adsorption region, a desorption region, and a cooling region,
- wherein the concentration apparatus further comprises:
- an exhaust gas flow path configured to introduce the exhaust gas from the emission source into the adsorption region;
- a desorption gas flow path configured to discharge a concentrated gas from the desorption region;
- a cooling gas flow path configured to introduce a cooling gas into the cooling region;
- and
- a recirculation flow path configured to be branched off from the desorption gas flow path and to join the cooling gas flow path, and
- wherein a portion of the concentrated gas in the desorption gas flow path is introduced into the cooling region through the recirculation flow path.
Dependencies are inferred from the claim text.