Apparatus and method for formation of metal-halide perovskite films

Abstract

Forming a perovskite film on a substrate includes atomizing a perovskite precursor composition to yield perovskite precursor droplets. accelerating the perovskite precursor droplets under sub-atmospheric pressure toward the substrate, collecting the perovskite precursor droplets on the substrate to yield a perovskite precursor layer on the substrate, and forming a perovskite film on the substrate. The perovskite precursor composition includes one or more perovskite precursors. The perovskite film has the crystal structure ABX3, where A represents one or more organic cations, one or more inorganic cations, or both, B represents one or more metal cations, and X represents one or more halide anions. A coated substrate includes a substrate and a perovskite precursor composition on the substrate. The perovskite precursor composition comprises a solvent and one or more perovskite precursors, and removing the solvent from the perovskite precursor composition yields a perovskite film on the substrate.

Dependencies are inferred from the claim text.