Substrate processing apparatus including shared rf generator
AssigneeASM IP Holding B.V.
InventorsJongSu Kim, DaeYoun Kim, Tomohiro Arakawa
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Abstract
A substrate processing apparatus is disclosed. Exemplary substrate processing apparatus may comprise a plurality of anneal chambers; a shared RF generator configured to generate a plasma to the anneal chambers; wherein the shared RF generator is electrically coupled to the anneal chambers via a RF divider; wherein the RF divider is provided with a plurality of RF cables, each of the RF cables is electrically coupled to each of the anneal chambers respectively.
Claims16
A substrate processing apparatus, comprising:
- a plurality of anneal chambers;
- a shared RF generator configured to generate a plasma to the anneal chambers;
- wherein the shared RF generator is electrically coupled to the anneal chambers via a RF divider;
- wherein the RF divider is provided with a plurality of RF cables, each of the RF cables is electrically coupled to each of the anneal chambers respectively.
The substrate processing apparatus according to 11, wherein an anneal chamber module comprises the plurality of anneal chambers;
- wherein a deposition chamber module comprises the plurality of deposition chambers.
Dependencies are inferred from the claim text.