Transformer Coupled Plasma Source with Uniformity Control Mechanisms for Small-Volume Chambers
AssigneeInspiring Atoms Pte Ltd
InventorYang Pan
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Abstract
Disclosed herein are systems and methods for a transformer-coupled plasma (TCP) source with uniformity control mechanisms, particularly for small plasma process chambers. The TCP source includes a center coil, an edge coil, and a middle coil. The center and edge coils receive a first pulsed RF power at a first frequency, while the middle coil receives a second pulsed RF power at a substantially lower frequency. Each pulse of the second RF power overlaps with a pulse of the first RF power to enhance plasma uniformity.
Claims20
A plasma source for a process system, comprising:
- a plurality of coils including a center coil, a middle coil and an edge coil, placed atop a vacuum chamber;
- a first RF power generator configured to supply a first RF power at a first frequency to the center coil;
- a second RF power generator configured to supply a second RF power at a second frequency to the middle coil;
- and
- a third RF power generator configured to supply the third RF power at a third frequency to the edge coil,
- wherein the second frequency is substantially lower than the first frequency and the third frequency.
A method for generating plasma within a process chamber, comprising:
- a. providing the process chamber with a vacuum environment, wherein the plasma is generated by a plasma source, which includes a center coil, a middle and an edge coil;
- b. receiving, by the center and the edge coils, an RF power waveform at a first frequency with a first pulsing scheme from a first RF power generator;
- and
- c. receiving, by the middle coil, a second RF power waveform at a second frequency with a second pulsing scheme from a second RF power generator,
- wherein each pulse from the second RF power waveform overlaps with a pulse from the first RF waveform.
Dependencies are inferred from the claim text.