Magnetic thin film process chamber design for high-density power converters
AssigneesApplied Materials, Inc., The Florida International University Board of Trustees
InventorsMudit Sunilkumar KHASGIWALA, Arvin KHOSRAVI, Subramani KENGERI, Markondeyaraj PULUGURTHA, Mohammad Mohtasim Hamid PIAL
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Abstract
A toroidal inductor may include a substrate. The toroidal inductor may also include a magnetic film deposited on the substrate during a manufacturing process, wherein the substrate is exposed to one or more magnetic fields creating local and/or spatially-variant anisotropy. The toroidal inductor may also include one or more metal windings deposited on the substrate corresponding to the spatially-variant anisotropy.
Claims20
A method of forming semiconductor devices, comprising:
- providing a substrate on a platform of a semiconductor processing chamber;
- providing a jig underneath the platform of the semiconductor processing chamber, the jig comprising one or more magnets placed on the jig according to a device layout plan;
- depositing a magnetic film on the substrate;
- depositing a metal layer on the magnetic film such that the respective semiconductor devices are formed at locations on the substrate according to the device layout plan, where the locations on the substrate experience a radially anisotropic magnetic field from at least one of the one or more magnets;
- and
- dicing the substrate according to the device layout plan such that the respective semiconductor devices are formed.
A semiconductor manufacturing jig, comprising:
- a bottom surface;
- a plurality of vertical partitions, attached to the bottom surface and defining one or more recesses corresponding to locations of semiconductor devices to be formed according to a device layout plan;
- and
- one or more magnets disposed in respective recesses of the one or more recesses corresponding to locations of semiconductor devices according to a device layout plan, wherein the one or more magnets produce respective magnetic fields on a substrate placed on the plurality of vertical partitions, the respective magnetic fields corresponding to the locations of the semiconductor devices to be formed.
A toroidal inductor, comprising:
- a substrate;
- a magnetic film deposited on the substrate during a manufacturing process, wherein the substrate is exposed to one or more magnetic fields creating locally and/or spatially-variant anisotropy;
- and
- one or more metal windings deposited on the substrate corresponding to the spatially-variant anisotropy.
Dependencies are inferred from the claim text.