Back to results
US 2026/0227697 A1Published application
Photoreactive compound, resist composition including the same, pattern formation method using the resist composition
AssigneeSamsung Electronics Co., Ltd.
InventorsDmitry ANDROSOV, Beomseok KIM, Hana KIM, Hyeran KIM, Hoyoon PARK, Kyuhyun IM
Life of this patent
Estimating the term…
Abstract
Provided are a photoreactive compound represented by Formula 1 below, a resist composition including the same, and a pattern formation method using the resist composition: For a description of Formula 1, refer to the specification.
Claims20
A photoreactive compound represented by Formula 1:
- wherein, in Formula 1,
- R1 is a photosensitive group or an acid-sensitive protecting group,
- R2 to R5 are each independently hydrogen;
- deuterium;
- a halogen;
- a cyano group;
- a nitro group;
- a hydroxy group;
- a C1-C30 monovalent hydrocarbon group optionally containing a heteroatom;
- a C1-C30 alkoxy group;
- a C1-C30 aryloxy group;
- a photosensitive group;
- or an acid-sensitive protecting group, and
- n is an integer from 1 to 10.
11 more elements
Dependencies are inferred from the claim text.