Wafer Sampling Recovery and Cleaning System, and Wafer Sampling Recovery and Cleaning Method Using Same
AssigneeWithtech Inc
InventorsKwon Sik Oh, Keon Soo Lee, Seoung Kyo Yoo
Life of this patent
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Abstract
A system for sampling wafer, recovering a sampling solution, and cleaning the remaining sampling solution. A wafer sampling recovery and cleaning system and a wafer sampling recovery and cleaning method using same have the effect of increasing the accuracy of a wafer sampling process by including a cleaning unit that cleans the surface of a recovery unit that recovers a sampling solution of a wafer.
Claims14
A wafer sampling solution retrieving and cleaning system applied to a wafer sampling solution device comprising a seating portion allowing wafer to be seated on one surface thereof and rotating the wafer and a sampling nozzle spraying a sampling solution on a surface of the wafer, the wafer sampling solution retrieving and cleaning system comprising:
- a retrieval unit fixed to the seating portion and disposed on an outer portion of the wafer to retrieve the sampling solution on an upper surface of the wafer;
- and
- a drain unit receiving the sampling solution from the retrieval unit and discharging the received sampling solution to the outside.
A wafer sampling solution retrieving and cleaning method using a wafer sampling solution retrieving and cleaning system, the wafer sampling solution retrieving and cleaning method comprising:
- (a) receiving a wafer sampling solution through a retrieval unit;
- (b) cleaning a blocking wall of the retrieval unit through a cleaning unit;
- and
- (c) discharging the sampling solution to the outside through a drain unit.
Dependencies are inferred from the claim text.