Semiconductor device, method for monitoring propagation length, and method for manufacturing semiconductor device
AssigneeRenesas Electronics Corporation
InventorYanzhe WANG
Life of this patent
Estimating the term…
Abstract
Provide a technology that can estimate a propagation length. An evaluation element includes a diffusion layer formed in a semiconductor substrate and a plurality of a pair of contacts electrically connected to the diffusion layer. The plurality of the pair of contacts are separated by a distance in the X direction. A width of the third contacts in the X direction is smaller than a width of a second contacts in the X direction. The width of the second contacts is smaller than a width of the first contacts in the X direction.
Claims10
A semiconductor device including an evaluation element, wherein the evaluation element comprising:
- a diffusion layer formed in a semiconductor substrate;
- an interlayer insulating film formed on the diffusion layer;
- a pair of first contacts, a pair of second contacts, and a pair of third contacts formed in the interlayer insulating film and electrically connected to the diffusion layer, wherein
- the first contacts are separated each other by a first distance in a first direction,
- the second contacts are separated each other by the first distance in the first direction,
- the third contacts are separated each other by the first distance in the first direction,
- each of the first contacts have a first width in the first direction,
- each of the second contacts have a second width in the first direction,
- each of the third contacts have a third width in the first direction,
- the third width is smaller than the second width, and
- the second width is smaller than the first width.
Dependencies are inferred from the claim text.