Apparatus for Extracting Low Energy Ion Beam
OwnerShengwu Chang, Christopher W. Campbell +1inventors
InventorsShengwu Chang, Christopher W. Campbell, Daniel Distaso
Life of this patent
Estimating the term…
Loading patent…
OwnerShengwu Chang, Christopher W. Campbell +1inventors
InventorsShengwu Chang, Christopher W. Campbell, Daniel Distaso
Estimating the term…
A workpiece processing system for extracting ion beams at low extraction voltages is disclosed. The workpiece processing system includes an ion source with an extraction plate having an extraction aperture. A ground electrode is rigidly affixed to the extraction plate so as to tightly control the positioning accuracy between the extraction aperture and the aperture in the ground electrode. A suppression electrode is located between the extraction plate and the ground electrode. This suppression electrode is also rigidly mounted so as to create a fixed first gap between the extraction plate and the suppression electrode and a fixed second gap between the suppression electrode and the ground electrode. This system may be operated at extraction voltages as low as 100V and as high as several kV.
A workpiece processing apparatus, comprising:
A workpiece processing apparatus, comprising:
A workpiece processing apparatus, comprising:
Dependencies are inferred from the claim text.