Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium

A method of processing a substrate, comprising:

• loading a substrate into a substrate processing space formed below a plasma generation space and communicating with the plasma generation space, which is formed in an upper container including a cylindrical portion;
• moving an electrode, which surrounds the upper container from outside of the cylindrical portion of the upper container, and a shield, which is configured to surround the electrode from outside in a radial direction of the cylindrical portion and to shield an electric field generated by the electrode, with respect to the upper container;
• supplying a processing gas to the plasma generation space;
• and
• supplying high-frequency power to the electrode to plasma-excite the processing gas supplied to the plasma generation space,
• wherein the moving of the electrode and the shield comprises:
• moving the electrode and the shield integrally, with respect to the upper container in a horizontal direction, by a mover.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform:

• loading a substrate into a substrate processing space formed below a plasma generation space and communicating with the plasma generation space, which is formed in an upper container including a cylindrical portion;
• moving an electrode, which surrounds the upper container from outside of the cylindrical portion of the upper container, and a shield, which is configured to surround the electrode from outside in a radial direction of the cylindrical portion and to shield an electric field generated by the electrode, with respect to the upper container;
• supplying a processing gas to the plasma generation space;
• and
• supplying high-frequency power to the electrode to plasma-excite the processing gas supplied to the plasma generation space,
• wherein the moving of the electrode and the shield comprises:
• moving the electrode and the shield integrally, with respect to the upper container in a horizontal direction, by a mover.