Mask calibration method for mask defect detection
AssigneeChangzhou Vip Semiconductor Equipment Co., Ltd
InventorDongliang XU
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AssigneeChangzhou Vip Semiconductor Equipment Co., Ltd
InventorDongliang XU
Estimating the term…
A mask calibration method for mask defect detection includes: S1, choosing a selected area with a pattern in a mask design file, and outputting vector points of the selected area; S2, using an automated optical inspection (AOI) device to acquire an actual image of a corresponding physical mask that corresponds to the selected area; and S3, setting a horizontal tolerance range in a horizontal direction of the selected area, and performing step S31: using different horizontal tolerance compensation values within the horizontal tolerance range to respectively fill and render the vector points output in step S1 into first rendered images; respectively registering the first rendered images obtained by rendering with the different horizontal tolerance compensation values with the actual image, employing an evaluation method to evaluate influences of the different horizontal tolerance compensation values on degrees of fit between the first rendered images and the actual image.
A mask calibration method for mask defect detection, comprising the following steps:
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